Thin Film Thickness Control Across Industries
Precision thickness. Better performance. Reliable results.
Industry
Sub-scenario / Process
Film Layer
Thickness Range
Application & Metrology Value
Semiconductor & Electronics
Photolithography
Photoresist
100 nm - 10 um
Controls lithography pattern accuracy and impacts chip yield
Insulation / Passivation
Dielectric films (SiO₂, Si₃N₄)
10 nm - 1 um
Gate oxide layer, interlayer dielectric; determines electrical performance of devices
Flexible Circuit Protection
Polyimide (PI) / UV coating
5 um - 50 um
FPC insulating protective layer; thickness affects flexibility and reliability
PV & New Energy
Interface Transport Layer
Buffer layers (NiOx, SnO₂, TiO₂, Coo)
10 nm - 100 nm
Carrier transport efficiency; thickness deviation impacts device performance
Light Absorption Layer
Silicon thin films (a-Si, uc-Si)
100 nm - 3 um
Controls spectral absorption across wavelength bands
Functional Layer
Perovskite wet / semi-dry / dry films
10 nm - 1 um
Full-stack metrology for in-line monitoring and closed-loop feedback
Transparent Electrode
Transparent conductive oxides (FTO, ITO, IWO)
200 nm - 1 um
Affects transmittance and conductivity—key efficiency parameters
CdTe Solar Cells
Full stack: CdS window, CdTe absorber, back contact (e.g. ZnTe:Cu)
10 nm - 8 um
Full-stack thickness control impacts Voc and conversion efficiency; boosts process yield
CIGS Solar Cells
Full stack: Mo back contact, CIGS absorber, CdS buffer, ZnO:Al window
30 nm - 2.5 um
Full-stack metrology—each layer thickness is critical for absorption, carrier transport and efficiency; enables closed-loop line control
Optics
Anti-Reflection Treatment
Anti-reflection (AR) coating
100 nm - 300 nm
Quarter-wave thickness control for minimum reflectance
Polarizing Components
Polarizer / polarizing film
10 um - 50 um
Ensures polarization efficiency and image uniformity
OLED Evaporation
Organic emissive & functional layers
10 nm - 200 nm
Organic layer thickness directly affects brightness and lifetime
Materials Science & Biomedicine
Anti-reflection Treatment
—
—
Quarter-wavelength thickness control to achieve minimum reflectivity
Polarizer Components
—
—
Ensures polarization efficiency and image uniformity
OLED Evaporation
—
—
Thickness of each organic layer directly affects display brightness and service life
Display Panels
Early Defect Catch Cuts Scrap Cost
—
—
Stops defects at source; scrap down; troubleshooting time cut 80%.
Process Consistency Raises Yield
—
—
Tighter uniformity control resolves uneven film and lowers defects.
Digital Traceability Boosts Efficiency
—
—
Full quality archive raises line efficiency and lowers total cost.
Food & Pharma Packaging
Lamination Adhesive
Adhesive / glue layer
5 um - 50 um
Measures adhesive between board/foil; affects seal strength and stiffness
Barrier Enhancement
Barrier coating (e.g. PVAC)
5 um - 30 um
Controls moisture/O₂ barrier; determines food shelf life
Consumer Electronics & Industrial Protection
PCB Protection
Conformal coating
3 um - 70 um
Moisture-, mold- and salt-fog protection for harsh-environment reliability
Surface Hardening / Decoration
PVD/CVD functional films (e.g. DLC)
50 nm - 5 um
Wear layers for phone mid-frames/watch cases; thickness affects durability and appearance
Semiconductor & Electronics
Sub-scenario / ProcessPhotolithography
Film LayerPhotoresist
Thickness Range100 nm - 10 um
Application & Metrology ValueControls lithography pattern accuracy and impacts chip yield
Sub-scenario / ProcessInsulation / Passivation
Film LayerDielectric films (SiO₂, Si₃N₄)
Thickness Range10 nm - 1 um
Application & Metrology ValueGate oxide layer, interlayer dielectric; determines electrical performance of devices
Sub-scenario / ProcessFlexible Circuit Protection
Film LayerPolyimide (PI) / UV coating
Thickness Range5 um - 50 um
Application & Metrology ValueFPC insulating protective layer; thickness affects flexibility and reliability
PV & New Energy
Sub-scenario / ProcessInterface Transport Layer
Film LayerBuffer layers (NiOx, SnO₂, TiO₂, Coo)
Thickness Range10 nm - 100 nm
Application & Metrology ValueCarrier transport efficiency; thickness deviation impacts device performance
Sub-scenario / ProcessLight Absorption Layer
Film LayerSilicon thin films (a-Si, uc-Si)
Thickness Range100 nm - 3 um
Application & Metrology ValueControls spectral absorption across wavelength bands
Sub-scenario / ProcessFunctional Layer
Film LayerPerovskite wet / semi-dry / dry films
Thickness Range10 nm - 1 um
Application & Metrology ValueFull-stack metrology for in-line monitoring and closed-loop feedback
Sub-scenario / ProcessTransparent Electrode
Film LayerTransparent conductive oxides (FTO, ITO, IWO)
Thickness Range200 nm - 1 um
Application & Metrology ValueAffects transmittance and conductivity—key efficiency parameters
Sub-scenario / ProcessCdTe Solar Cells
Film LayerFull stack: CdS window, CdTe absorber, back contact (e.g. ZnTe:Cu)
Thickness Range10 nm - 8 um
Application & Metrology ValueFull-stack thickness control impacts Voc and conversion efficiency; boosts process yield
Sub-scenario / ProcessCIGS Solar Cells
Film LayerFull stack: Mo back contact, CIGS absorber, CdS buffer, ZnO:Al window
Thickness Range30 nm - 2.5 um
Application & Metrology ValueFull-stack metrology—each layer thickness is critical for absorption, carrier transport and efficiency; enables closed-loop line control
Optics
Sub-scenario / ProcessAnti-Reflection Treatment
Film LayerAnti-reflection (AR) coating
Thickness Range100 nm - 300 nm
Application & Metrology ValueQuarter-wave thickness control for minimum reflectance
Sub-scenario / ProcessPolarizing Components
Film LayerPolarizer / polarizing film
Thickness Range10 um - 50 um
Application & Metrology ValueEnsures polarization efficiency and image uniformity
Sub-scenario / ProcessOLED Evaporation
Film LayerOrganic emissive & functional layers
Thickness Range10 nm - 200 nm
Application & Metrology ValueOrganic layer thickness directly affects brightness and lifetime
Materials Science & Biomedicine
Sub-scenario / ProcessAnti-reflection Treatment
Film Layer—
Thickness Range—
Application & Metrology ValueQuarter-wavelength thickness control to achieve minimum reflectivity
Sub-scenario / ProcessPolarizer Components
Film Layer—
Thickness Range—
Application & Metrology ValueEnsures polarization efficiency and image uniformity
Sub-scenario / ProcessOLED Evaporation
Film Layer—
Thickness Range—
Application & Metrology ValueThickness of each organic layer directly affects display brightness and service life
Display Panels
Sub-scenario / ProcessEarly Defect Catch Cuts Scrap Cost
Film Layer—
Thickness Range—
Application & Metrology ValueStops defects at source; scrap down; troubleshooting time cut 80%.
Sub-scenario / ProcessProcess Consistency Raises Yield
Film Layer—
Thickness Range—
Application & Metrology ValueTighter uniformity control resolves uneven film and lowers defects.
Sub-scenario / ProcessDigital Traceability Boosts Efficiency
Film Layer—
Thickness Range—
Application & Metrology ValueFull quality archive raises line efficiency and lowers total cost.
Food & Pharma Packaging
Sub-scenario / ProcessLamination Adhesive
Film LayerAdhesive / glue layer
Thickness Range5 um - 50 um
Application & Metrology ValueMeasures adhesive between board/foil; affects seal strength and stiffness
Sub-scenario / ProcessBarrier Enhancement
Film LayerBarrier coating (e.g. PVAC)
Thickness Range5 um - 30 um
Application & Metrology ValueControls moisture/O₂ barrier; determines food shelf life
Consumer Electronics & Industrial Protection
Sub-scenario / ProcessPCB Protection
Film LayerConformal coating
Thickness Range3 um - 70 um
Application & Metrology ValueMoisture-, mold- and salt-fog protection for harsh-environment reliability
Sub-scenario / ProcessSurface Hardening / Decoration
Film LayerPVD/CVD functional films (e.g. DLC)
Thickness Range50 nm - 5 um
Application & Metrology ValueWear layers for phone mid-frames/watch cases; thickness affects durability and appearance