
Microscopic Thin Film Thickness Measurement Instrument


Specification
| Product Model | SE200 |
|---|---|
| Spectral Range | 380~1000nm (expandable to 200~1700nm) |
| Spot Size | 1μm (100X) ~ 100μm (5X), 3 aperture options |
| Thickness Range | 4nm ~ 450μm |
| Accuracy | Repeatability ≤0.02nm; Absolute accuracy 0.2% or 1nm |
| Sample Compatibility | 4''~12'' wafers, various sheet samples |
| Data Output | Film thickness, n/k values, reflectance spectrum, mapping atlas |
| Interface | Standard C-mount for microscope, USB 2.0 for PC connection |
Functionalities

Precise Micro-area Detection: Adjustable 1μm-100μm spot with CCD visual positioning

Sub-nanometer Accuracy: 0.02nm repeatability and better than 0.05nm long-term stability

Wide Measuring Range: Covers 4nm to 450μm with UV-Vis-NIR multi-band options

Easy Integration & NDT: Standard C-mount interface for existing microscopes; non-contact measurement



